INTRODUCTION
HISTORY - Ever since the development of modern semiconductor device
theory scientists have speculated on whether it is possible to make a
two-terminal negative resistance device.
The TUNNEL
DIODE was the first such device to be
realised in practice. Its operation depends on the properties of a forward
biased p-n junction in which both the p and n regions are heavily doped.
Transferred
electron devices are another type of these devices. The transferred electron
device or GUNN OSCILLATORS operate simply by the application of a dc voltage to
a bulk semiconductor. There are no p-n junction in this device. Its frequency
is a function of the load and of natural frequency of the circuit.
The third
type of these device are AVALANCHE TRANSIT-TIME DEVICES. The avalanche diode
oscillator uses carrier impact ionization and drift in the high field region of
a semiconductor junction to produce a negative resistance at microwave
frequencies.
An avalanche
transistor is a bipolar junction transistor designed for operation in the
region of its collector-current/collector-to-emitter voltage characteristics
beyond the collector to emitter breakdown voltage, called avalanche breakdown
region . This region is characterized by avalanche breakdown, a phenomenon
similar to Townsend discharge for gases, and negative differential resistance.
Operation in the avalanche breakdown region is called avalanche mode operation:
it gives avalanche transistors the ability to switch very high currents with
less than a nanosecond rise and fall times (transition times).
The device
was originally proposed in a theoretical paper by READ in which he analysed the
negative-resistance properties of an idealised n+ -p-i-p+ diode.
BASIC
PRINCIPLE AND MODES
Avalanche
transit-time diode oscillators rely on the effect of voltage breakdown across a
reverse-biased p-n junction to produce a supply of holes and electrons.
Two distinct
modes of avalanche oscillator have been observed. One is the IMPATT mode, which
stands impact ionization avalanche transit time operation. In this mode the
typical dc-to-RF conversion efficiency is 5 to 10%, and frequencies are as high
as 100 GHz with silicon diodes.
The other
mode is the TRAPATT mode, which represents trapped plasma avalanche triggered
transit operation. Its typical conversion efficiency is from 20-60%.
Another type
of active microwave device is the BARITT diode, which stands for barrier
injected transit-time diode. It has long drift regions similar to those of IMPATT
diodes. The carrier traversing the drift regions of BARITT diodes are generated
by minority carrier injection from forward biased junctions rather than being
extracted from the plasma of an avalanche region. Some structures of BARITT
diodes are p-n-p , p-n-v-p , p-n-metal etc.
IMPATT diode
IMPact
Avalanche Transit Time diode is a high power radio frequency (RF) generator
operating from 3 to 100 gHz. IMPATT diodes are fabricated from silicon, gallium
arsenide, or silicon carbide.
An IMPATT
diode is reverse biased above the breakdown voltage. The high doping levels
produce a thin depletion region. The resulting high electric field rapidly
accelerates carriers which free other carriers in collisions with the crystal
lattice. Holes are swept into the P+ region. Electrons drift toward the N
regions. The cascading effect creates an avalanche current which increases even
as voltage across the junction decreases. The pulses of current lag the voltage
peak across the junction. A “negative resistance” effect in conjunction with a
resonant circuit produces oscillations at high power levels (high for
semiconductors).

IMPATT
diode: Oscillator circuit and heavily doped P and N layers.
The resonant
circuit in the schematic diagram of Figure is the lumped circuit equivalent of
a waveguide section, where the IMPATT diode is mounted. DC reverse bias is
applied through a choke which keeps RF from being lost in the bias supply. This
may be a section of waveguide known as a bias Tee. Low power RADAR transmitters
may use an IMPATT diode as a power source. They are too noisy for use in the
receiver. [YMCW]
Gunn diode
A gunn diode
is solely composed of N-type semiconductor. As such, it is not a true diode.
Figure shows a lightly doped N- layer surrounded by heavily doped N+ layers. A
voltage applied across the N-type gallium arsenide gunn diode creates a strong
electric field across the lightly doped N- layer.
.
Gunn diode: Oscillator circuit and cross
section of only N-type semiconductor diode

As voltage is increased, conduction increases due to
electrons in a low energy conduction band. As voltage is increased beyond the
threshold of approximately 1 V, electrons move from the lower conduction band
to the higher energy conduction band where they no longer contribute to
conduction. In other words, as voltage increases, current decreases, a negative
resistance condition. The oscillation frequency is determined by the transit
time of the conduction electrons, which is inversely related to the thickness
of the N- layer.
The frequency may be controlled to some extent by
embedding the gunn diode into a resonant circuit. The lumped circuit equivalent
shown in Figure is actually a coaxial transmission line or waveguide. Gallium
arsenide gunn diodes are available for operation from 10 to 200 gHz at 5 to 65
mw power. Gunn diodes may also serve as amplifiers.
COMPARISON BETWEEN GUNN DIODE & IMPATT DIODE
Gunn diodes
and IMPATT diodes use high field effects in semiconductor materials to drive a
negative resistance mode of operation. Gunn diodes use the Gunn effect to
produce microwave oscillations when a constant voltage is applied. Gunn diodes
are a type of transferred electron device (TED). They generate relatively
low-power microwave radio signals at frequencies from a few GHz up to 200 GHz.
As a discrete component, a Gunn diode can be used as an oscillator or amplifier
in applications that require low-power radio frequency (RF) signals, such as
proximity sensors and wireless local area networks (LAN). IMPATT diodes are
semiconductor devices that generate relatively high-power microwave signals at
frequencies between about 3 GHz and 100 GHz or more. IMPATT is an abbreviation
for impact avalanche transit time. IMPATT diodes are used in low-power radar
systems and alarms. The main drawback of using an IMPATT diode is the high
level of phase noise that the device generates.
Gunn diodes
and IMPATT diodes are similar, but not interchangeable. Gunn diodes that are
made from gallium arsenide can operate at frequencies up to 200 GHz. A Gunn
diode made from gallium nitride can reach 3 THz. Specifications for Gunn diodes
include frequency range, minimum power, typical operating voltage, operating
current, and packaging. For higher output power, a Gunn diode can be pulsed or
stacked. Specifications for IMPATT diodes include frequency range (GHz),
bandwidth range (GHz), power output (W), breakdown voltage, and gain (dB). To
help maintain frequency and power stability over wide temperature ranges, the
diode manufacturer can supply heatsink stands and temperature controllers. An IMPATT
diode can be stable (linear) or injection-locked. A pulsed IMPATT diode
operates with short bias current pulses and low duty cycles, and can produce
higher output power than a continuous wave (CW) IMPATT diode.
IMPATT DIODE
An IMPATT
diode (IMPact ionization Avalanche Transit-Time) is a form of high power diode
used in high-frequency electronics and microwave devices. They are typically
made with silicon carbide owing to their high breakdown fields.
They operate
at frequencies between about 3 and 100 GHz or more. A main advantage is their
high power capability. These diodes are used in a variety of applications from
low power radar systems to alarms. A major drawback of using IMPATT diodes is
the high level of phase noise they generate. This results from the statistical
nature of the avalanche process. Nevertheless these diodes make excellent
microwave generators for many applications.
Device
structure
The IMPATT
diode family includes many different junctions and metal semiconductor devices.
The first IMPATT oscillation was obtained from a simple silicon p-n junction
diode biased into a reverse avalanche break down and mounted in a microwave
cavity. Because of the strong dependence of the ionization coefficient on the
electric field, most of the electron–hole pairs are generated in the high field
region. The generated electron immediately moves into the N region, while the
generated holes drift across the P region. The time required for the hole to
reach the contact constitutes the transit time delay.
The original
proposal for a microwave device of the IMPATT type was made by Read and
involved a structure. The Read diode consists of two regions (i) The Avalanche
region (a region with relatively high doping and high field) in which avalanche
multiplication occurs and (ii) the drift region (a region with essentially
intrinsic doping and constant field) in which the generated holes drift towards
the contact. A similar device can be built with the configuration in which
electrons generated from the avalanche multiplication drift through the
intrinsic region.
An IMPATT
diode generally is mounted in a microwave package. The diode is mounted with
its high–field region close to a copper heatsink so that the heat generated at
the diode junction can be readily dissipated. Similar microwave packages are
used to house other microwave devices.
Principle of
operation
Impact
ionization
If a free
electron with sufficient energy strikes a silicon atom, it can break the
covalent bond of silicon and liberate an electron from the covalent bond. If
the electron liberated gains energy by being in an electric field and liberates
other electrons from other covalent bonds then this process can cascade very
quickly into a chain reaction producing a large number of electrons and a large
current flow. This phenomenon is called impact avalanche.
At
breakdown, the n – region is punched through and forms the avalanche region of
the diode. The high resistivity region is the drift zone through which the
avalanche generated electrons move toward the anode.
Consider a
dc bias VB, just short of that required to cause breakdown, applied to the
diode. Let an AC voltage of sufficiently large magnitude be superimposed on the
dc bias, such that during the positive cycle of the AC voltage, the diode is
driven deep into the avalanche breakdown. At t=0, the AC voltage is zero, and
only a small pre-breakdown current flows through the diode. As t increases, the
voltage goes above the breakdown voltage and secondary electron-hole pairs are
produced by impact ionization. As long as the field in the avalanche region is
maintain above the breakdown field, the electron-hole concentration grows
exponentially with t. Similarly this concentration decays exponentially with
time when the field is reduced below breakdown voltage during the negative
swing of the AC voltage. The holes generated in the avalanche region disappear
in the p+ region and are collected by the cathode. The electrons are injected
into the i – zone where they drift toward the n+ region. Then, the field in the
avalanche region reaches its maximum value and the population of the
electron-hole pairs starts building up. At this time, the ionization
coefficients have their maximum values. The generated electron concentration
does not follow the electric field instantaneously because it also depends on
the number of electron-hole pairs already present in the avalanche region.
Hence, the electron concentration at this point will have a small value. Even
after the field has passed its maximum value, the electron-hole concentration
continues to grow because the secondary carrier generation rate still remains
above its average value. For this reason, the electron concentration in the
avalanche region attains its maximum value at, when the field has dropped to
its average value. Thus, it is clear that the avalanche region introduces a 90o
phase shift between the AC signal and the electron concentration in this
region.
With a
further increase in t, the AC voltage becomes negative, and the field in the
avalanche region drops below its critical value. The electrons in the avalanche
region are then injected into the drift zone which induces a current in the
external circuit which has a phase opposite to that of the AC voltage. The AC
field, therefore, absorbs energy from the drifting electrons as they are
decelerated by the decreasing field. It is clear that an ideal phase shift between
the diode current and the AC signal is achieved if the thickness of the drift
zone is such that the bunch of electron is collected at the n+ - anode at the
moment the AC voltage goes to zero. This condition is achieved by making the
length of the drift region equal to the wavelength of the signal. This
situation produces an additional phase shift of 90o between the AC voltage and
the diode current.

TRAPATT
diode
A p-njunction
diode, similar to the IMPATT diode, but characterized by the formation from a trapped
space-charge plasma within the junction region; used in the generation and
amplification of microwave power.Derived from trapped plasma avalanche transit
time diode.
I.
INTRODUCTION
The trapped plasma
avalanche transit time (TRAPATT)diode was developed as a pulsed high power
microwaveoscillator.1.2 Oscillators built using TRAPATT diodes must operate at
high power levels to generate the trapped plasma.
The high currents
involved tend to filament through the device causing "hot spots" and
device failure. Since the device operates in the breakdown region a good
portion of the oscillationperiod, fabrication while maintaining controlled,
hard breakdown is
desirable. If the breakdown voltage and device capacitances are not constant
from device to device the external circuit design can be difficult. Currently
the TRAPATT diode is used very little because of these problems with
reliability, fabrication, circuit design, and because
of the avalanche mechanism
involved, phase noise. Although, the traditional use of the TRAPATI diode is in
oscillator design, the work presented here uses the diode in the time domain to
generate high speed and high voltage
pulses. Operation of
the TRAPAIT diode is at low pulse repetition frequencies (PRF), on the order of
1 kHz, with risetimes less than 300 ps and amplitudes greater than 1 kYoThe
pulses contain wide spectral content needed in many
areas of
instrumentation such as high speed photography, gating of microchannel plate
image intensifiers,3-s and ultrawide and radar.6 Other researchers have
reported similar behaviour in devices'-lO which have been called avalanche
diodes. This work wiIl describe, for the first time, selection of a commercial
diode for TRAPAlT operation and the design of a driver circuit. These
limitations, until now, have been the main reason low jitter pulse generators
with kV level amplitudes and picosecond risetimes have not been widely
available for use in physics research instruments.
II. OPERATION IN THE
TIME DOMAIN
Figure 1 shows the
basic scheme used to generate these picosecond-kilovolt signals. A pulse
generator with an amplitudelarger than the breakdown voltage of the diode is applied
to the diode in the reverse direction. When the pulse is applied to the circuit
the diode will first break down, i.e., the diode wiIllook like a zener diode,
and then if the amplitude of the driving signal is large enough, so that a
large current flows in the circuit, the diode will go into second BREAKDOWN
Second breakdown can
be thought of as a change in diode voltage from the primary breakdown voltage
to some much lower value. Since KVL must be maintained in the circuit this is
usually accompanied by an increase in the current flowing through the device.
Destruction of the device is usually associated with second breakdown. However,
if the amount of energy passed through the diode is limited, destructionis
avoided. This usually means narrow pulses, <10 ns, must be used. The
transition from primary breakdown to
second breakdown can
occur in tens of picoseconds. During this time the trapped plasma is being
formed within the diode. IT a p+ N-N+ diode is used as a TR.APATI diode then the
formation of the electron-hole plasma begins at the
p+ N- junction and
travels across the N- region to the N-N+ junction leaving the N- region filled
with the trapped plasma, Fig. 2. The apparent velocity of the plasma should be
much larger than the saturation velocity of electrons and
holes in the
semiconductor for proper operation. The plasma is formed by exciting electrons
below the valence band into states above the conduction band. The result is
generation of a gaseous conductor (plasma) in picoseconds. Externally this appears
as a switch closing in a time dependent on the
plasma formation.
III. REQUIREMENTS FOR
GENERATION OF THE
TRAPPED PLASMA
Following the above discussion
it might be concluded that the input pulse risetime is not critical to the
operation of the circuit. This, however, is not the case. Second breakdown (plasma
formation) is triggered by a current level. That is, when the device is in
primary breakdown the current flowing
in the diode must
reach a critical level, I crit' for second breakdown to occur. Also the velocity
of the plasma, v z' is dependent on the current level present when the diode
begins to go into second breakdown. This was derived by! Assuming the diode was
driven with a constant current source as
Vz= I/Q Nd A
where I is the current
through the diode, q is electron charge,
N D is doping concentration
of the N- region, and A is the
cross sectional area.
The larger the current flowing in the
diode, the faster the
plasma will sweep across the device and
thus the switch will
close in less time. Since v z should be
greater than the
saturation velocity of carriers in the semiconductor,
v s' the critical
current density is given by setting
the saturation
velocity equal to the plasma velocity, or
lcri'= vsqNoA. (2)
This equation is
useful in understanding how the various diode parameters affect I cril'
However, from a circuit design point of view an alternate description of the
maximum input transition time of the drive signal is desirable. The current flowing
in the diode prior to breakdown is a displacement current due to the diode
junction capacitance.


HENCE THE STUDY ON
IMPATT AND TRAPATT DIODE IS DONE.
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